The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2000
Filed:
Jul. 27, 1995
Wolfgang Benecke, Berlin, DE;
Bernd Wagner, Berlin, DE;
Gunter Fuhr, Berlin, DE;
Rolf Hagedorn, Berlin, DE;
Thorsten Muller, Berlin, DE;
Abstract
Disclosed is a process for manipulating microscopic dielectric particles in which particles are exposed to an electric field. In disadvantaged processes the particles are exposed to inhomogeneous electric field and are polarized by them. The polarized particles are moved in the direction of higher field strength. These processes permit no reversal of the traveling direction of the particles. The particles are enriched at the electrode so that they cannot be retained in free space. In the invented process the particles are exposed to high-frequency field traveling in one or more prescribed direction, by which the particles are subject to a force which sets them in a motion that is strongly synchronous to the field. With the aid of a device for carrying out the invented process, the particles can be manipulated very flexibly. By means of linearly or circularly disposed electrodes, the particles can be moved on linear paths in any direction including through branched microstructures, they can be separated according to their dielectric properties and retained without contact. Applications are in the fields of biotechnology and molecular separation, focussing and microtransport technology.