The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2000
Filed:
Mar. 23, 1999
Kazuo Ichikawa, Kanagawa, JP;
Shinichi Miyamoto, Kanagawa, JP;
Kenichi Miyamoto, Kanagawa, JP;
Tomoyuki Takiue, Kanagawa, JP;
Yutaka Takeo, Kanagawa, JP;
Susumu Yoshida, Shizuoka-ken, JP;
Hisao Kanzaki, Shizuoka-ken, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A box-shaped shielding cover is disposed at the surface of a developing solution contained in a developing tank and the bottom wall of the cover ensures that contact between the developing solution and the air is kept to a minimum and that deterioration of the processing solution due to carbon dioxide and evaporation of the water are controlled. Moreover, the close contact between the top portion of the peripheral wall of the shielding cover and the top cover covering the top portion of the PS plate processor cuts off the flow of air over the developing tank (the air flowing from the insertion aperture to the discharge aperture). Accordingly, the airtightness of the seal in the developing section is enhanced, there is minimal deterioration of the developing solution due to carbon dioxide, and the rate of replenishment of the developing solution is reduced.