The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2000
Filed:
Jun. 02, 1998
Applicant:
Inventors:
Yongan Wu, Woburn, MA (US);
Constance J Chang-Hasnain, Union City, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F / ;
U.S. Cl.
CPC ...
702 84 ; 702180 ; 702181 ; 702182 ;
Abstract
An efficient method for optimization of product characteristics or manufacturing processes. The method utilized a Chi-square model to identify error sources that contribute to the product or process variability. The method is particularly useful for evaluation of processes related to optics and electronics fabrication but also has application in fields where a chi-square distribution is observed.
Wu, Yongan. (2000). Method for quality control and yield enhancement (U.S. Patent No. 6148268). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6148268
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile