The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2000
Filed:
Jul. 03, 1997
Shih-Jong J Lee, Bellevue, WA (US);
Chih-Chau L Kuan, Redmond, WA (US);
Neopath, Inc., Redmond, WA (US);
Abstract
An incremental concurrent learning method starts with providing potential defects and fabrication information and a primary classification rule and secondary classification rule selection from a knowledge defect database from multiple products with different process cycles. The method then performs a truth inquiry to update a classification rule database for use by the primary classification rule and secondary classification rule selection. The method performs a primary defect classification and checks the confidence of the classification, and performs a secondary defect classification if the confidence is not high. If the confidence of the secondary defect classification is not high, a new defect may have been discovered and a novelty defect detection step is performed to define artifacts or potential new defect types to provide information for the truth inquiry.