The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2000

Filed:

Nov. 16, 1998
Applicant:
Inventors:

Yong-ki Kim, Sungham, KR;

Deok-yong Ko, Suwon, KR;

Joong-yeon Jeong, Seoul, KR;

Hyung-seok Lee, Seoul, KR;

Yeon-wook Jung, Euijungbu, KR;

Assignee:

Samsung Aerospace Industries, Ltd., Kyongsangnam-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 67 ; 355 53 ;
Abstract

An exposure apparatus includes a frame member with a first stage having a substrate disposed thereon provided in a lower portion of the frame member. A leveling mechanism is provided for adjusting an orientation of the first stage. The exposure apparatus further includes a second stage positioned over the first stage and fixed to the frame member. A reticle is positioned on the second stage. An exposure area limiting mechanism is provided in the exposure apparatus and positioned over the second stage. The exposure area limiting mechanism defines an opening through which light is capable of passing during exposure for limiting an exposure area of the second stage. The exposure apparatus also includes an illumination system to irradiate light to the exposure area limiting means. The illumination system includes a shutter and an exposure sensor for sensing an amount of light that will exit the illumination system, wherein the shutter is controlled in response to the exposure sensor to control the amount of light exiting the illumination system to the exposure area limiting mechanism. A detecting mechanism for detecting alignment of the first and second stages also is provided in the exposure apparatus.


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