The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2000
Filed:
Jan. 16, 1998
Applicant:
Inventors:
Joseph W Lyding, Champaign, IL (US);
Karl Hess, Champaign, IL (US);
Assignee:
The Board of Trustees, University of Illinois, Urbana, Urbana, IL (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
438798 ; 438 38 ; 438509 ; 438522 ; 438530 ; 438974 ; 438303 ; 257607 ;
Abstract
Described are preferred processes for conditioning semiconductor devices with deuterium to improve operating characteristics and decrease depassivation which occurs during the course of device operation. Also described are semiconductor devices which can be prepared by such processes.
Lyding, Joseph. (2000). Forming of deuterium containing nitride spacers and fabrication of (U.S. Patent No. 6147014). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6147014
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile