The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2000
Filed:
Jan. 28, 1999
Applicant:
Inventors:
Tatsuo Fukui, Kanagawa, JP;
Koichi Tatsuki, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
451 42 ; 451446 ;
Abstract
By polishing an optical device such as .beta.-BBO crystals using a liquid suspension comprising a fine powder of silicon oxide and a liquid lubricant of saturated hydrocarbon, satisfactory mirror face polishing can be applied to the optical device, without deteriorating the surface property while reducing occurrence of fine optical defects.
Fukui, Tatsuo. (2000). Polishing method, method of manufacturing an optical device, and a (U.S. Patent No. 6146251). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6146251
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile