The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2000
Filed:
Jun. 23, 1999
Ichiro Igarashi, Nagoya, JP;
Tetsuji Jitsumatsu, Nagoya, JP;
Toagosei Co., Ltd., Tokyo, JP;
Abstract
The present invention provides a curable composition for back-protecting material used in making shadow masks which gives a cured film excellent in all of etching resistance, alkali solubility or peelability, and pattern formability even when a second etching is carried out at high temperatures. That is, the present invention provides a curable composition for back-protecting material used at a second etching step in making shadow masks which comprises the following components (a), (b) and (c) and which gives a cured film having alkali solubility or alkali peelability:
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile