The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2000
Filed:
Mar. 31, 1999
Hiroyuki Ohta, Osaka, JP;
Yoshitaka Sakaue, Osaka, JP;
Eiji Ohno, Osaka, JP;
Noboru Yamada, Osaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A method for manufacturing an optical information recording medium having an excellent mechanical strength, thermal stability, and improved overwrite cycle property can be provided by forming the dielectric layer by using a mixed target comprising ZnS and SiO.sub.2 in an atmosphere comprising rare gas and at least oxygen at the side where the dielectric layer does not contact to the recording layer. The optical information recording medium is manufactured by using the substrate, the recording layer comprising a material that varies reversibly between the optically identifiable states by an irradiation of a laser beam, and the dielectric layer at least one side of which has a two-layered structure at the upper and lower sides of the recording layer. At least one of the dielectric layers that does not contact to the recording layer is formed by using a mixed target comprising ZnS and SiO.sub.2 in a mixed atmosphere comprising rare gas and oxygen.