The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2000
Filed:
Sep. 12, 1997
Gerald R Leverant, San Antonio, TX (US);
James Arps, San Antonio, TX (US);
John Campbell, San Antonio, TX (US);
Richard Page, San Antonio, TX (US);
Southwest Research Institute, San Antonio, TX (US);
Abstract
Superalloy substrates bearing a rhenium diffusion barrier, and a method of forming a rhenium diffusion barrier between a superalloy substrate and an overlay coating comprising aluminum. The method involves depositing a rhenium film onto the surface of a superalloy substrate and subjecting the rhenium film to first conditions effective to cause a minor portion of rhenium atoms to penetrate the surface of the superalloy substrate and second conditions effective to cause a minority of the rhenium atoms to diffuse into the substrate, forming a diffusion barrier comprising an interfacial zone comprising a mixture of rhenium atoms and atoms of the superalloy substrate covered by a rhenium film. The diffusion barrier is effective to suppress diffusion of aluminum from the overlay coating under static oxidation testing conditions.