The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2000
Filed:
Mar. 23, 1999
Michael Mermelstein, Cambridge, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
A synthetic aperture system for producing a non-periodic pattern in a region of overlap. The system includes a source of electromagnetic radiation producing a plurality of electromagnetic beams, a plurality of beam controllers positioned to receive a respective one of the plurality of electromagnetic beams and direct the respective electromagnetic beam into the region of overlap; and a system controller in electrical communication with each of the plurality of the beam controllers. Each beam controller controls at least one of the phase, amplitude and polarization of a respective one of the plurality of electromagnetic beams in response to control signals from the system controller. The result is a non-periodic pattern formed within the region of overlap by the interference of a plurality of electromagnetic beams in response to the control signals from the system controller. The invention also relates to a method for producing a non-periodic pattern in a region of overlap. The method includes the steps of providing a plurality of electromagnetic beams, directing the plurality of electromagnetic beams into the region of overlap, and modulating at least one of the phase, amplitude and polarization of at least one of the plurality of electromagnetic beams to thereby form a predetermined non-periodic pattern in the region of overlap by the interference of the plurality of electromagnetic beams.