The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2000
Filed:
Sep. 21, 1998
Yona Eckstein, Kent, OH (US);
Ramakrishna Ravikiran, North Royalton, OH (US);
The B. F. Goodrich Company, Richfield, OH (US);
Abstract
A low molecular weight polyether oligomer is modified with a salt during chain extending reaction of the polyether oligomer to form electrostatic dissipative polymer products such as polyurethanes, polyether amide block copolymers and polyether-ester block copolymers. The reaction product polymers exhibit relatively low surface and volume resistivities, and static decay times which are not too fast or too slow, yet are free of excessive amounts of extractable anions, particularly chlorine, nitrate, phosphate and sulfate. The electrostatic dissipative polymers can be blended with a variety of base polymers to form plastic alloys, which in turn can be utilized to form articles useful in the manufacture of electrostatic sensitive electronic devices.