The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2000

Filed:

Dec. 11, 1997
Applicant:
Inventors:

Robert M Wallace, Richardson, TX (US);

Peijun Chen, Dallas, TX (US);

S Charles Baber, Richardson, TX (US);

Steven A Henck, Plano, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438700 ; 438709 ; 438710 ; 438720 ; 438745 ; 438754 ;
Abstract

An integrated circuit fabrication process in which residual fluorine contamination on metal surfaces after ashing is removed by exposure to an NH.sub.3 /O.sub.2 plasma.


Find Patent Forward Citations

Wallace, Robert. (2000). Low temperature process for post-etch defluoridation of metals (U.S. Patent No. 6140243). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6140243

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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