The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2000
Filed:
Dec. 10, 1999
Ichiro Mihara, Tachikawa, JP;
Shoichi Kotani, Ome, JP;
Takeshi Wakabayashi, Sayama, JP;
Masami Hiramoto, Chofu, JP;
Casio Computer Co., Ltd., Tokyo, JP;
Abstract
A plating tray includes a recessed region in a central portion of an insulating substrate for arranging therein a silicon semiconductor substrate and a metal film arranged to surround the recessed region. The semiconductor substrate is housed in the recessed region. Under this condition, a dry photoresist film containing Na, K, Ca and Cu in amounts smaller than predetermined amounts is formed to cover a metal underlying film. Then, a projecting electrode is formed by electroplating within open portions formed in the resist film. In forming the projecting electrode, the open portion is also formed in that region of the resist film which corresponds to the metal film of the plating plate so as to form a dummy projection electrode simultaneously.