The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2000
Filed:
Feb. 19, 1998
Applicant:
Inventors:
Ralph E Hurd, Milipitas, CA (US);
Napapon Sailasuta, Morgan Hill, CA (US);
James Tropp, Berkeley, CA (US);
Patrick L Le Roux, Palaiseau, FR;
Assignee:
General Electric Company, Milwaukee, WI (US);
Primary Examiner:
Int. Cl.
CPC ...
G01V / ;
U.S. Cl.
CPC ...
324307 ; 324309 ;
Abstract
Chemical shift error in proton magnetic resonance spectroscopy is reduced by applying a volume excitation pulse sequence such as PRESS and very selective out-of-volume saturation pulses to limit that volume to a volume-of-interest free of the misregistration errors associated with the excitation sequence. The resulting volume is then only limited by the very small chemical shift misregistration of the very selective saturation pulses.