The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2000
Filed:
Apr. 14, 1998
Applicant:
Inventors:
James F Loan, Mansfield, MA (US);
Jack P Salerno, Waban, MA (US);
Assignee:
CVD Systems, Inc., North Billerica, MA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
438758 ; 438584 ;
Abstract
A method for chemical vapor deposition includes dispensing a precursor to a vaporizer positioned within a vaporization chamber and delivering a vapor to a process chamber without a carrier gas. A flow meter is positioned within the delivery conduit for measuring the flow rate of precursor through the delivery conduit. A flow controller is likewise positioned within the delivery conduit for controlling the flow of precursor in response to the measured flow rate.