The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2000

Filed:

Oct. 29, 1999
Applicant:
Inventors:

Lauri Monica Nelson, Orlando, FL (US);

Mario Pita, Winter Springs, FL (US);

Chester Lamar Harris, Orlando, FL (US);

Assignee:

Lucent Technologies, Inc., Murray Hill, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438 12 ;
Abstract

A method is provided for performing in-line process checks in an integrated circuit fabrication process. The process checks are performed on actual product wafers, rather than control wafers. According to the method, production lots of product wafers are subjected to in-line testing. Selected wafers representing each chamber of the fabrication apparatus are tested for defects. Using the actual product wafers allows the detection of the quantity, size, type, composition, and even the cause of the defects. When defects are found, the fabrication process and apparatus are adjusted to avoid producing additional lots with undesirable defects.


Find Patent Forward Citations

Nelson, Lauri. (2000). Migration from control wafer to product wafer particle checks (U.S. Patent No. 6136615). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6136615

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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