The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2000
Filed:
Mar. 06, 1998
Christopher L Fletcher, Santa Barbara, CA (US);
Raytheon Company, Lexington, MA (US);
Abstract
A method for forming very large scale integrated circuit devices employs a reticle having plural discrete image fields which may be respectively blocked off and exposed to form patterns on an integrated circuit wafer substrate. The division of the circuit pattern to be imaged into separate image fields is based on repeatable horizontal, vertical and two dimensional structures in the overall circuit pattern of the integrated circuit. By repeatedly exposing image fields corresponding to repeatable structures, the size of the integrated circuit device may be scaled without requiring similar scaling of the reticle itself. Efficient exposure of an entire wafer may be provided by having image fields including circuit patterns which include the scribe lanes which separate the integrated circuits on the wafer to be imaged.