The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2000
Filed:
Dec. 03, 1997
Daewoo Electronics Co., Ltd., Seoul, KR;
Abstract
An inventive method for manufacturing an array of M.times.N thin film actuatable mirrors, the method being capable of preserving the structural integrity thereof, comprises the steps of: preparing an active matrix; depositing a passivation layer and an etchant stopping layer, successively, on top of the active matrix; forming a thin film sacrificial layer; depositing a first mask layer made of a silicon oxide; forming a second mask layer; forming an array of M.times.N pair of cavities, one of the cavities in each pair exposing a portion of one of the connecting terminals; removing the first and the second mask layer; forming an array of M.times.N actuating structures; removing the thin film sacrificial layer to thereby form the array of M.times.N thin film actuatable mirrors. During the formation of the cavities, the cavities is formed into a trapezoidal shape as a result of the difference in the etching rate between the first mask layer and the thin film sacrificial layer.