The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2000

Filed:

Feb. 17, 1999
Applicant:
Inventors:

Atsushi Shiozaki, Kyoto, JP;

Ako Omata, Saitama-ken, JP;

Yumi Yoshida, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
20419229 ; 2041921 ; 20419212 ; 20429813 ; 20429816 ; 20429819 ; 20429817 ; 136256 ; 136252 ; 136265 ; 257431 ; 257433 ; 257434 ; 427571 ; 428702 ; 438 57 ; 438 69 ; 438 85 ;
Abstract

A deposition method is adapted to deposit a zinc oxide film that has a high light transmittance, an adequate specific electric resistance and a large thickness at a high deposition rate and at low cost in a process that may last long but is stable. The method for depositing a zinc oxide film on a substrate held in an inert gas atmosphere is conducted by magnetron sputtering so that the maximum magnetic flux density in a direction parallel to the surface of the zinc oxide target is held to be not higher than 350 gauss.


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