The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2000
Filed:
Oct. 21, 1998
Applicant:
Inventors:
Daisuke Takeuchi, Tsukuba, JP;
Hideyo Okushi, Tsukuba, JP;
Koji Kajimura, Tsukuba, JP;
Hideyuki Watanabe, Tsukuba, JP;
Primary Examiner:
Int. Cl.
CPC ...
H05H / ; C23C / ;
U.S. Cl.
CPC ...
427577 ; 4272498 ;
Abstract
A method for producing homoepitaxial diamond thin film is provided which includes a step of effecting plasma assisted CVD with the carbon source concentration of a mixed gas of a carbon source and hydrogen set to a first low level for depositing a high-quality homoepitaxial diamond thin film on a substrate at a low film forming rate and a step of thereafter effecting the plasma assisted CVD with said carbon source concentration set to a second level higher than the first level.