The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2000
Filed:
Sep. 28, 1998
Tamarak Pandumsoporn, Fremont, CA (US);
Mark Feldman, Castro Valley, CA (US);
Alcatel, Paris, FR;
Abstract
A magnetron reactor for providing a high density of plasma is disclosed. The reactor comprises a plasma reactor chamber that is adapted for receiving a processing gas in the chamber and is further adapted for connection to an evacuation source. A direct current driven magnetron is positioned within the reactor chamber and is adapted to hold a sputtering target. A movable substrate supporting pedestal, adapted to hold a substrate, is positioned within the reactor and is movable so as to place the substrate sufficiently proximate to the sputtering target to enable deposition of sputter products thereon. The substrate pedestal is connected to a first radio frequency signal source through an impedence matchbox having a phase shifting adjustment means. To provide a high density inductively coupled plasma, a radio frequency antenna, having a substrate end, is positioned about the chamber. The antenna is connected to a second radio frequency signal source through an impedence matchbox. The reactor of the present invention also includes an electromagnetic coil that is positioned around and adjacent to the substrate end of the radio frequency antenna.