The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2000
Filed:
Dec. 08, 1997
Atsushi Shiozaki, Kyoto, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
The present invention is to provide a method for producing a photovoltaic element having a reflective layer with high reflectivity and with high reliability and thus showing high photoelectric conversion efficiency, and especially to provide a production method causing no change in the reflection characteristics of a deposited film, even in continuous production on a long substrate for a long period. The production method of a photovoltaic element of the present invention is a method for producing a photovoltaic element having a reflective layer and a semiconductor layer on a long substrate, comprising the steps of supplying an inert gas, hydrogen atoms, and oxygen atoms into a vacuum vessel housing the substrate and effecting sputtering by use of a target comprising aluminum, thereby forming the reflective layer on the substrate.