The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2000
Filed:
Feb. 24, 1999
Applicant:
Inventors:
Ping Jin, Aichi, JP;
Sakae Tanemura, Aichi, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419226 ; 20419215 ; 20419218 ; 20419225 ; 20419227 ; 20419228 ; 20429812 ; 20429813 ;
Abstract
The present invention provides a method for producing a samarium monosulfide piezochromic thin film, and the present invention relates to a process for producing a thin film material at a high film formation rate by forming a samarium monosulfide thin film on a substrate by a reactive sputtering deposition process, which is a process for producing a samarium monosulfide (SmS) thin film, characterized by co-sputtering a disamarium trisulfide (Sm.sub.2 S.sub.3) compound target and a samarium (Sm) metal target simultaneously in an inert gas discharge.