The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2000
Filed:
Apr. 09, 1999
Sony Corporation, Tokyo, JP;
Abstract
Disclosed herein is a vacuum deposition apparatus including a vacuum chamber having an opening, a substrate to form a thin film thereon provided in the vacuum chamber, an evacuating device connected to the vacuum chamber for evacuating the vacuum chamber, a moving unit provided movably relative to the opening of the vacuum chamber, the moving unit having a cover for openably closing the opening of the vacuum chamber and a supporting member projecting from the cover, a reactor unit removably mounted on the supporting member of the moving unit for forming a thin film on the substrate in the condition where the reactor unit is moved into the vacuum chamber by the moving unit, and a positioning device provided in the vacuum chamber and having a retainer for separating the reactor unit from the supporting member of the moving unit and for retaining the rector unit with a given gap defined between the reactor unit and the substrate. With this configuration, a thin film can be accurately formed on the substrate, and the maintenance of the reactor unit can be easily carried out.