The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2000
Filed:
Feb. 21, 1996
Applicant:
Inventors:
Avishai Nevel, Providence, RI (US);
Kendall W Gordon, Jr, North Kingston, RI (US);
David Bonneau, West Boylston, MA (US);
Assignee:
Lawson-Hemphill, Inc., Central Falls, RI (US);
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
3562382 ; 25055924 ; 356430 ; 83361 ; 83371 ; 28227 ;
Abstract
A system or method for electronically simulating fabrics to assist in grading yarn and fabric qualities, in which the diameter or other qualities of one or more yarn samples along the total length of the samples is measured, and representations of the measured yarn qualities are evaluated in a fabric pattern to assist evaluation of the effects of the yarn quality variations on fabric which potentially would be produced from the sampled yarn.