The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2000

Filed:

Aug. 06, 1997
Applicant:
Inventors:

Susumu Hasegawa, Sakai, JP;

Hajime Watanabe, Osaka, JP;

Yoshimi Asai, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G09G / ;
U.S. Cl.
CPC ...
345194 ; 345141 ; 345467 ; 345470 ;
Abstract

A character pattern generating apparatus includes a CPU and a memory for pre-storing character shape skeleton data, element skeleton shape data, element skeleton shape data, and element outline shape data. The CPU determines whether a thickness of a character is to be altered or not from a standard thickness, and determines whether the process of altering the thickness of each constituent element in the element outline shape data is to be performed by calculation, or by replacing the element with an alternative element in the case where character thickness is to be altered. The CPU then alters the thickness in the element outline shape data according to the determination and deforms the element skeleton shape data based on the character shape skeleton data. Associated therewith, the CPU alters the element outline shape data based on the altered element skeleton shape data and generates a character pattern from the altered element outline shape data.


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