The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2000
Filed:
Jan. 13, 1999
Applicant:
Inventors:
Charles E May, Gresham, OR (US);
Thomas J Goodwin, Austin, TX (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G23C / ;
U.S. Cl.
CPC ...
430-5 ; 20419233 ;
Abstract
Various methods of fabricating a reticle are provided. In one aspect, a pattern of opaque structures is formed on a plate capable of transmitting electromagnetic radiation. Adjacently positioned angled surfaces of the opaque structures are identified. Preselected portions of the opaque structures that encompass the adjacently positioned angled surfaces are then removed by ion-beam milling or other methods. Reticle patterns may be customized by modifying the structures of adjacent polygon structures that could otherwise give rise to diffraction-induced patterning errors on resist layers.