The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2000
Filed:
Mar. 23, 1998
Fujitsu Limited, Kawasaki, JP;
Abstract
The electromagnetic field intensity of an electromagnetic wave radiating from a multilayer substrate is correctly computed. A radiating electromagnetic wave analysis apparatus comprises a signal layer electric current distribution computation unit for obtaining the distribution of an electric current flowing through a signal layer in a distributed constant line approximation method or a transmission line analysis method; a multilayer substrate electric current distribution computation unit for computing the distribution of an electric current of an entire multilayer substrate in a moment method based on the distribution of the electric current obtained by the signal layer electric current distribution computation unit; and an electromagnetic field intensity computation unit for computing the electromagnetic field intensity of an electromagnetic wave radiating from a multilayer substrate based on the distribution of the electric current of the entire multilayer substrate computed by the multilayer substrate electric current distribution computation unit. The radiating electromagnetic wave analysis apparatus establishes a modelling method for quantitatively analyzing the state of the electric current flowing through a wave source and load and then flowing into a power supply layer and a ground layer.