The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2000
Filed:
Jan. 26, 1998
Applicant:
Inventors:
Charles E Weitzel, Mesa, AZ (US);
Karen E Moore, Phoenix, AZ (US);
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
438694 ; 438700 ; 438703 ; 438167 ; 438571 ; 438576 ;
Abstract
A method of performing electron beam lithography on high resistivity substrates including forming semiconductor material on a high resistivity substrate and etching the semiconductor material to form mesas with electrically interconnecting bridges between the mesas. Semiconductor devices are formed in the mesas employing electron beam lithography and charges generated by the electron beam lithography are dispersed along the interconnecting bridges thereby preventing charge accumulation on the mesas. The bridges are removed by etching or sawing during die separation.