The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2000
Filed:
Apr. 08, 1999
Akihiko Shimizu, Kanagawa-ken, JP;
Ricoh Company, Ltd., Yokohama, JP;
Abstract
The invention relates to a method of manufacturing a stamper with a uniform groove having a width smaller that the beam diameter of the exposure light spot for use with the optical information recording medium. In the method of manufacturing the stamper for exposing and developing the photoresist layer on the glass base plate, a water-soluble resin layer having a film thickness equal to the depth of the groove formed on the surface of the stamper is provided between the glass base plate (master plate) and the photoresist layer. A micro-pattern is formed on the photoresist layer by way of exposing the master plate. The photoresist layer is used as a mask. A micro-pattern is formed on the lower layer (water-soluble resin layer), by etching the water-soluble resin layer. Thereafter, the photoresist layer is removed. In this way, the glass master plate has a micro-pattern formed thereon.