The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2000

Filed:

Mar. 18, 1997
Applicant:
Inventors:

Nageshwer Rao Bantu, Endicott, NY (US);

Anilkumar Chinuprasad Bhatt, Johnson City, NY (US);

Ashwinkumar Chinuprasad Bhatt, Endicott, NY (US);

Joseph Alphonse Kotylo, Binghamton, NY (US);

Gerald Walter Jones, Johnson City, NY (US);

Robert John Owen, Binghamton, NY (US);

Kostas Papathomas, Endicott, NY (US);

Anaya Kumar Vardya, Endicott, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
430315 ; 430313 ; 430325 ; 430329 ; 430331 ;
Abstract

Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and photoresists. Both the developers and the strippers include benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.


Find Patent Forward Citations

Bantu, Nageshwer. (2000). Photoresist develop and strip solvent compositions and method for their (U.S. Patent No. 6127097). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6127097

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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