The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2000
Filed:
Dec. 08, 1998
Applicant:
Inventors:
Vincent Gourlaouen, Houilles, FR;
Francois Remy, Franconville, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C06D / ; C09K / ;
U.S. Cl.
CPC ...
252372 ;
Abstract
A plasmagenic gas comprising a ternary mixture of helium, argon and hydrogen. The gas contains less than 30% helium, at least 55% argon, and from 5.5 to 15% hydrogen. The gas is useful in a thermal treatment process, such as the plasma projection of a refractory or metallic material.
Gourlaouen, Vincent. (2000). Ternary gaseous mixture (U.S. Patent No. 6126858). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6126858
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile