The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2000
Filed:
Nov. 07, 1997
Applicant:
Inventors:
Robert Frew Gillespie, Abingdon, GB;
Stephen Ivor Hall, Oxford, GB;
David Raybone, Stow-on-the-Wold, GB;
Fiona Winterbottom, Oxford, GB;
Assignee:
AEA Technology PLC, Didcot, GB;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ; C23C / ; H05H / ;
U.S. Cl.
CPC ...
156348 ; 1187 / ; 1187 / ; 438726 ; 438729 ; 427575 ; 216 69 ; 216 71 ; 42218629 ;
Abstract
A plasma enhanced gas reactor including a reaction chamber having a pair of field-enhancing electrodes each of which has an axial passage through it by one of which a reactant gas is admitted to the reaction chamber, and by the other of which reaction products are removed from the reaction chamber.