The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2000
Filed:
Dec. 22, 1998
William K Warburton, Menlo Park, CA (US);
Edward Oltman, Mountain View, CA (US);
Other;
Abstract
A method for attenuating x-rays which is insensitive to the x-ray energy employs forward scattering through a filter element to minimize energy shifts due to Compton scattering. Efficiency can be enhanced by employing a material with a large small angle scattering cross section. Since attenuation in the filter increases rapidly with decreasing x-ray energy, the filter provides larger, thinner scattering areas for low energy x-rays and smaller, thicker scattering areas for higher energy x-rays. By adjusting the relative fractions of the scattering areas and their thicknesses, the total scattering yield through the filter can be made to be essentially independent of x-ray energy over a broad band of x-ray energies.