The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2000
Filed:
Aug. 12, 1998
Applicant:
Inventor:
Atsushi Takizawa, Kawasaki, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504911 ; 2504922 ;
Abstract
The pattern exposure method formes a pattern by a combination of a reduction projection exposure system 10 and an electron beam exposure system 20. An optical strain in a region of a prescribed size exposed by the reduction projection exposure system 10 is measured by a coordinates detection system 30. A first pattern of a shot size is exposed by the reduction projection exposure system 10, and a second pattern to be superimposed on the first pattern is formed by the electron beam exposure system 20, correcting based on a correction value which is based on the optical strain in the region of the prescribed size measured by the coordinates detection system 30.