The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2000

Filed:

Jun. 22, 1998
Applicant:
Inventors:

Susumu Otsuka, Osaka, JP;

Kunio Hayakawa, Osaka, JP;

Ikuo Shimoda, Tokyo, JP;

Kiyoharu Suzuki, Tokyo, JP;

Masami Mochimaru, Tokyo, JP;

Mitsuru Miyazaki, Tokyo, JP;

Assignees:

Okumura Corporation, Osaka, JP;

Oiles Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16M / ; E04H / ;
U.S. Cl.
CPC ...
248580 ; 521675 ; 248638 ;
Abstract

A seismic isolation apparatus is structured such that a pair of seismic isolation mechanisms are formed each having a pair of upper and lower clamping members formed in the shape of a rectangular frame, wherein upper and lower roller guide surfaces, in each of which a longitudinal central portion is formed as a concavely arcuate curved surface and portions respectively extending therefrom are formed as convexly arcuate curved surfaces, are formed on the four sides of the upper and lower clamping members, and wherein rollers each having a circular cross section are respectively interposed between the upper and lower roller guide surfaces. The pair of seismic isolation mechanisms are installed by being superposed on top of each other such that the rolling directions of the rollers in the two seismic isolation mechanisms are perpendicular to each other. During the occurrence of an earthquake, the rollers are adapted to roll in contact with the upper and lower roller guide surfaces so as to absorb and dampen seismic waves in the longitudinal and transverse directions of the apparatus.


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