The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2000

Filed:

Oct. 19, 1999
Applicant:
Inventor:

Brian Chiu, Kaohsiung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65D / ;
U.S. Cl.
CPC ...
206508 ; 222570 ;
Abstract

A plurality of insulating jugs are stackable one over the other. Each of the insulating jugs includes a jug body and a lid. The jug body has a top, a bottom, a receiving chamber, and a pouring opening disposed adjacent to a top of the jug body over the receiving chamber. The lid is disposed on the top of the jug body and has a seat member engaging the jug body over the pouring opening, a displaceable closure member disposed below the seat member and movable to close and open the pouring opening, and an operating lever extending over the seat member and connected to the closure member to actuate the closure member. A hollow cap is disposed over the seat member. The cap has a slot for outward extension of the operating lever from the closure member, and an upwardly projecting central boss. The central boss has a flat top face that is substantially flush with a part of the operating lever when the operating lever closes the pouring opening. The bottom of each of the insulating jugs is capable of resting on the cap of another one of the insulating jugs, and has a projection to surround the central boss of the cap, and a central positioning space surrounded by the projection to receive the central boss. The central boss has a height that is smaller than a depth of the positioning space.


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