The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2000
Filed:
Dec. 04, 1998
Applicant:
Inventors:
Weng-Yi Chen, Chupei, TW;
Kuen-Chu Chen, Hsinchu Hsien, TW;
Assignee:
United Integrated Circuits Corp., Shinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438433 ; 438225 ; 438297 ; 438362 ; 438439 ;
Abstract
The method of the invention starts with forming a mask on a blank wafer, wherein the mask contains a number of openings that expose a portion of the wafer. By performing a wet oxidation process, field oxide is formed on the exposed surface of the wafer. The wafer surface is then become ragged after the mask and the field oxide are removed. In order to further increase the surface area of a dummy wafer, an etching process is performed on the ragged surface after a hemispherical grained layer is formed on the ragged surface.