The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2000
Filed:
Nov. 20, 1998
Daniel J Treadwell, Cedar Park, TX (US);
Curtis L Shoemaker, Round Rock, TX (US);
3M Innovative Properties Company, Saint Paul, MN (US);
Abstract
A method and apparatus for ablating features in a substrate, the apparatus includes a radiation source and first and second rotating transparent uniformly thick disks positioned between the radiation source and a substrate to be irradiated. The method comprises irradiating the substrate with radiation that has passed through the first and second rotating disks, wherein the first and second disks are independently rotating at different angular velocities to create a predetermined irradiation pattern on the substrate. The disks may have a relative acceleration. The method and apparatus may be used to ablate nozzles having longitudinal axes which are non-orthogonal with the surface of the substrate and which are not parallel to each other.