The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2000
Filed:
Apr. 20, 1998
Yasuharu Tanaka, Saitama-ken, JP;
Teruyuki Midorikawa, Saitama-ken, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A method of developing photoresist films formed on a plurality of substrates utilizes a circulated developing fluid to sequentially develop the photoresist films with developing accuracy and controllability secured. It includes the steps of measuring the conductivity and the absorbance of the developing fluid, calculating the pH value or its equivalence thereof in accordance with the conductivity and absorbance measured in the measuring step; and maintaining the pH value or its equivalence to be in a predetermined range. There are also disclosures as to an apparatus for developing photoresist films, and a color filter and a liquid crystal display device manufactured by the method of developing photoresist films.