The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2000
Filed:
Apr. 16, 1998
Applicant:
Inventors:
Assignee:
Seimi Chemical Co., Ltd., Chigasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
C09K / ; C09C / ; C09G / ;
U.S. Cl.
CPC ...
51309 ; 51307 ; 106-3 ; 438693 ; 423263 ;
Abstract
A polishing agent for semiconductor, comprising cerium oxide particles having a weight average particle size of from 0.1 to 0.35 .mu.m and a crystallite size of from 150 to 600 .ANG..
Aihara, Ryohei. (2000). Polishing agent for semiconductor and method for its production (U.S. Patent No. 6120571). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6120571
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile