The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2000
Filed:
Feb. 01, 1999
Angelo Yializis, Tucson, AZ (US);
Shahid A Pirzada, Tucson, AZ (US);
Wolfgang Decker, Tucson, AZ (US);
Sigma Technologies International, Inc., Tucson, AZ (US);
Abstract
A plasma treater incorporates a porous metallic layer in one of the electrodes. The porous layer is selected with pores of average size within one order of magnitude of the mean free path of the plasma gas at atmospheric pressure. The plasma gas is injected into the electrode at substantially atmospheric pressure and allowed to diffuse through the porous layer, thereby forming a uniform glow-discharge plasma. The film material to be treated is exposed to the plasma created between this electrode and a second electrode covered by a dielectric layer. Because of the micron size of the pores of the porous metal, each pore also produces a hollow cathode effect that facilitates the ionization of the plasma gas. As a result, a steady-state glow-discharge plasma is produced at atmospheric pressure and at power frequencies as low as 60 Hz.