The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2000
Filed:
Aug. 10, 1998
Ramesh Krishnamurti, Williamsville, NY (US);
Sandor Nagy, Grand Island, NY (US);
Qi Wang, Grand Island, NY (US);
Habib Hichri, Williamsville, NY (US);
Occidental Chemical Corporation, Dallas, TX (US);
Abstract
Disclosed is a method of inhibiting the formation of scale on reactor surfaces in contact with a polymerizing vinyl monomer comprising contacting said monomer with a terpolymer which comprises the condensation reaction product of (A) an aromatic compound that contains the group ##STR1## where Q is OR or SR and R is hydrogen, alkyl from C.sub.1 to C.sub.15, or aryl, alkaryl, or aralkyl from C.sub.6 to C.sub.15 : (B) about 0.1 to about 10 moles of a carbonyl compound per mole of said aromatic compound; and (C) about 0.1 to about 10 moles of a thiourea per mole of said aromatic compound.