The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2000
Filed:
Jun. 17, 1999
Applicant:
Inventor:
Yasuhisa Yamada, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430296 ; 430942 ;
Abstract
A pattern drawing method by directly writing a pattern with a charged particle electron beam, in which a resist containing metal powders is applied on a substrate having a substrate pattern formed thereon, so to form a resist film, and a desired pattern is written by exposing the resist film with a charged particle electron beam.