The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2000

Filed:

Jul. 12, 1999
Applicant:
Inventors:

Wen-Fa Sung, Hsinchu, TW;

Jin-Yuh Lu, Miaoli Hsien, TW;

Yao-Ching Su, Tainen Hsien, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
445 24 ; 430315 ;
Abstract

A front plate for a plasma display panel (PDP) and its modified fabricating method are provided using a backside exposure process and an appropriate processing sequence rearrangement to reduce the number of photomasks required and improve the accuracy of exposure and developing process. First, a light-shielding layer is patterned by performing a mesh printing process, or by performing an exposure and developing process using a first photomask, so as to form a light-shielding structure including black stripes and transparent electrodes' gaps. Next, using the light-shielding structure as a mask, a backside exposure and developing process as well as an etching process is performed to form a plurality of pairs of transparent electrodes on the substrate. Then, using a second photomask, another set of exposure, developing and etching processes are performed to form a plurality of pairs of metal electrodes on the corresponding transparent electrodes.


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