The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2000
Filed:
Apr. 26, 1999
Michael Lee, Ta-Li, TW;
United Integrated Circuits Corp., Hsinchu, TW;
Abstract
A method for forming a bottom electrode of a capacitor is provided. A substrate having a conductive region is provided. A first insulation layer, a stop layer and a second insulation layer are formed on the substrate in order. The first insulation layer, the stop layer and the second insulation layer are patterned to form an opening. The opening exposes the conductive region in the substrate. A first conductive layer is formed on the second insulation layer and fills the opening, and then the first conductive layer is defined to form a plug and a metal plate. The plug can be electrically connected with the conductive region. The metal plate is used as a mask, and the second insulation layer is removed by anisotropic etching to form a third insulation layer having a first distance from the third insulation layer surface to the stop layer surface. Then, the third insulation layer is removed by isotropic etching to form a fourth insulation layer having a second distance from the fourth insulation layer surface to the stop layer surface. A second conductive layer is formed on the fourth insulation layer and the metal plate. Finally, the second conductive layer is removed by anisotropic etching to expose the metal plate and a portion of the fourth insulation layer. Then, the fourth insulation layer is removed by isotropic etching to expose the stop layer and the plug.