The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2000
Filed:
Dec. 05, 1996
Applicant:
Inventors:
Junichi Shimizu, Yokohama, JP;
Shujiro Watanabe, Yokohama, JP;
Satoru Takaki, Yokohama, JP;
Hisashi Osaki, Yokohama, JP;
Takuji Oyama, Yokohama, JP;
Eiichi Ando, Ibaraki-ken, JP;
Assignee:
Asahi Glass Company Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419212 ; 20419215 ; 20419218 ; 20419222 ; 20419223 ; 20419226 ; 20419229 ; 20429806 ; 20429808 ;
Abstract
A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.