The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2000
Filed:
Nov. 19, 1998
Webster C Cash, Jr, Boulder, CO (US);
Focused X-Rays, LLC, Boulder, CO (US);
Abstract
A new class of x-ray optic suitable for use in x-ray proximity lithography employs many mirror facets arranged in a grazing incidence geometry at a relatively large distance from the mask. Each mirror facet is substantially flat in that its radius of curvature is substantially larger than the target. Each facet creates an optically independent channel that covers the entire target. The facets are arranged so that many channels can simultaneously illuminate the target, thereby achieving high flux at the target with high uniformity. Constraints on local and global divergence at the mask are met by making the optic sufficiently small and placing it sufficiently distant from the target.