The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2000
Filed:
Apr. 23, 1999
Applicant:
Inventors:
Thomas Waas, Munchen, DE;
Hans Hartmann, Wessling, DE;
Assignee:
Applied Integrated Systems & Software, Munchen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438707 ; 216 60 ; 216 66 ; 438-8 ; 438742 ; 438949 ;
Abstract
A method for generating information for producing a pattern, defined by design information on a medium, using at least one direct-writing pattern generating process, which first provides the design information and then calculates correction data based on the provided design information and depending on the pattern generating process which corrects pattern faults in the pattern to be generated which were caused by the pattern generating process. The design and correction information is then separately provided to the direct-writing pattern generating process for its activation.